| 摘要 |
PROBLEM TO BE SOLVED: To provide an antistatic substrate film for semiconductor manufacturing tape excellent in electrical characteristics without bleeding to a roll etc. by uniformly dispersing a high polymer-based antistatic agent. SOLUTION: In the antistatic substrate film for semiconductor manufacturing tape, a 1 to 60 pts.wt. polyether-based high polymer type antistatic agent and a 1 to 60 pts.wt. resin composition obtained by subjecting maleic anhydride to graft polymerization are added to a 100 pts.wt. resin composition that takes ethylene-based copolymer resin as a chief component. Herein, in the antistatic substrate film for semiconductor manufacturing tape, the resin obtained by subjecting maleic anhydride to graft polymerization is added by an equal amount or more to the polyether-based high polymer type antistatic agent. COPYRIGHT: (C)2006,JPO&NCIPI |
