发明名称 |
Negative resist composition and process for formation of resist patterns |
摘要 |
A negative resist composition includes a polymer having any one of dicarboxylate monoester compounds represented by the following general formulae (1) and (2) as a monomer component: wherein, R<SUB>1 </SUB>and R<SUB>2 </SUB>represent alkyl chains having 0 to 8 carbon atoms, R<SUB>3 </SUB>represents a substituent having at least two or more alicyclic structures, and R<SUB>4 </SUB>and R<SUB>5 </SUB>represent hydrogen atoms or alkyl groups having 1 to 8 carbon atoms. A method for forming a resist pattern uses the above negative resist composition. By containing the polymer, a resistance to dry etching and a resistance to electron beam from a scanning electron microscope (SEM) are enhanced as well as a solubility in an alkali developing solution is maintained.
|
申请公布号 |
US2006134545(A1) |
申请公布日期 |
2006.06.22 |
申请号 |
US20050549849 |
申请日期 |
2005.12.12 |
申请人 |
IWASHITA JYUN;TACHIKAWA TOSHIKAZU |
发明人 |
IWASHITA JYUN;TACHIKAWA TOSHIKAZU |
分类号 |
G03C1/76;C08F22/16;C08F220/28;G03F7/033;G03F7/038;H01L21/027 |
主分类号 |
G03C1/76 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|