| 摘要 |
1,202,572. Reactive gas plasmas. WESTERN ELECTRIC CO. Inc. 17 Aug., 1967 [1 Sept., 1966; 28 April, 1967], No. 37929/67. Heading CIA. [Also in Divisions C7 and H5] A reactive gas plasma for treating an article is sustained between two spaced electrodes by feeding a reactant gas into the zone between the electrodes containing the article and flowing a protective gas around at least the cathode, the flow rates of the gases being adjusted so that a static interface exists between the reactant gas and the protective gas. In the example, Si 3 N 4 is deposited on a Si substrate from a mixture of N 2 and 0À01-1% SiBr 4 at 0À1-10 Torr and 300-800‹ C. Reaction zone 10 contains substrate 14 mounted on R.F. heated pedestal 13. Electrode chambers 11 and 12 contain anode 16 and cathode 17 and are fed with protective gas, e.g. Ar, He, N 2 , CO 2 , or air, through ports 18 and 19. The reactant gas is fed in at 20 and the plasma extends between exhaust ports 21 and 22. A magnet may be used to deflect the plasma on to the substrate. |
