发明名称 Method of machining substrate and method of manufacturing element
摘要 A method of machining a substrate etches a substrate according to a predetermined length and depth from an intersection between a first predetermined dividing line and a second predetermined dividing line, which cross each other in a T-shaped line, along the second predetermined dividing line of the predetermined dividing lines being used to cut the substrate, and divides the substrate along the predetermined dividing lines which are not etched by laser machining.
申请公布号 US2006134885(A1) 申请公布日期 2006.06.22
申请号 US20050300108 申请日期 2005.12.14
申请人 SEIKO EPSON CORPORATION 发明人 YAMAZAKI YUTAKA;UMETSU KAZUSHIGE
分类号 H01L21/78;H01L21/301;H01L21/46 主分类号 H01L21/78
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