发明名称 Method for opto-electronic geometry determination involves radiation device through which radiation is irradiated into entrance opening, to recess wall and then falls on sensor device and evaluated by evaluation unit
摘要 <p>Opto-electronic geometry determination involves a radiation device (3) through which radiation is irradiated. The first part of the radiation is irradiated into the entrance opening (9) to the recess wall (1) and withdraws reflection from the recess outlet (10). The second part carries the radiation to the evaluation unit (5) through the sensor device (4) which determines at least one parameter of the actual geometry of the recess. The measured values are determined by the sensor device and are evaluated by the evaluation unit. An independent claim is also included for a device for irradiating the radiation in the above method.</p>
申请公布号 DE102004059975(A1) 申请公布日期 2006.06.22
申请号 DE20041059975 申请日期 2004.12.13
申请人 SIEMENS AG 发明人 EICHLER, KAI-AXEL;LENK, ANDREAS
分类号 G01B11/24;G01B11/12;G01B11/14 主分类号 G01B11/24
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