发明名称 RADIATION CURABLE COMPOSITION, STORING METHOD THEREOF, FORMING METHOD OF CURED FILM, PATTERNING METHOD, USE OF PATTERN, ELECTRONIC COMPONENTS AND OPTICAL WAVEGUIDE
摘要 <p>The present invention provides a radiation curing composition comprising (a): a siloxane resin, (b): a photoacid generator or photobase generator, and (c): a solvent capable of dissolving component (a) and containing an aprotic solvent.</p>
申请公布号 EP1672426(A1) 申请公布日期 2006.06.21
申请号 EP20040792147 申请日期 2004.10.07
申请人 HITACHI CHEMICAL COMPANY, LTD. 发明人 SAKURAI, HARUAKI;ABE, KOICHI
分类号 C08G77/04;C08L83/00;G02B6/12;G03F7/004;G03F7/038;G03F7/075;H01L21/027;(IPC1-7):G03F7/075 主分类号 C08G77/04
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