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发明名称
CALIBRATION PATTERN FOR PHOTO MASK
摘要
申请公布号
KR20060069604(A)
申请公布日期
2006.06.21
申请号
KR20040108108
申请日期
2004.12.17
申请人
HYNIX SEMICONDUCTOR INC.
发明人
LEE, SANG IEE
分类号
H01L21/66
主分类号
H01L21/66
代理机构
代理人
主权项
地址
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