发明名称 Semiconductor device and method of fabricating the same
摘要 According to the present invention, there is provided a semiconductor device having: first and second fins formed on a semiconductor substrate to oppose each other, and made of a semiconductor layer; an active region which is formed on the semiconductor substrate so as to be connected to the first and second fins, and supplies a predetermined voltage to the first and second fins; and a gate electrode formed on an insulating film formed on the semiconductor substrate, in a position separated from the active region by a predetermined spacing, so as to cross the first and second fins, wherein in the active region, a predetermined portion between a first portion connected to the first fin and a second portion connected to the second fin is removed.
申请公布号 US7064024(B2) 申请公布日期 2006.06.20
申请号 US20050135334 申请日期 2005.05.24
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 YAGISHITA ATSUSHI
分类号 H01L21/338 主分类号 H01L21/338
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