发明名称 Semiconductor device utilizing both fully and partially depleted devices
摘要 A semiconductor device such as a DPAM memory device is disclosed. A, Substrate ( 12 ) of semiconductor material is provided with energy band modifying means in the form of a box region ( 38 ) and is covered by an insulating layer ( 14 ). A semi-conductor layer ( 16 ) has source ( 18 ) and drain ( 20 ) regions formed therein to define bodies ( 22 ) of respective field effect transistors. The box region ( 38 ) is more heavily doped than the adjacent body ( 22 ), but less highly doped than the corresponding source ( 18 ) and drain ( 20 ), and modifies the valence and/or conduction band of the body ( 22 ) to increase the amount of electrical charge which can be stored in the body ( 22 ).
申请公布号 US7061050(B2) 申请公布日期 2006.06.13
申请号 US20040487157 申请日期 2004.02.18
申请人 INNOVATIVE SILICON S.A. 发明人 FAZAN PIERRE;OKHONIN SERGUEI
分类号 H01L27/01;H01L21/8242;H01L27/108;H01L27/12;H01L29/739;H01L29/786;H01L29/788;H01L31/0392 主分类号 H01L27/01
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