发明名称 Control system, lithographic apparatus, device manufacturing method, and device manufactured thereby
摘要 A control system for a positioning device includes a controller connected in a feedback loop. The controller calculates a current for supply to the positioning device according to the error between a desired current value and a measured current value. This current is converted to a voltage by an amplifier and further modified by a feedforward voltage calculated using mechanical and electrical characteristics of the positioning device and a desired position and/or desired derivatives of position.
申请公布号 US7061587(B2) 申请公布日期 2006.06.13
申请号 US20040842639 申请日期 2004.05.11
申请人 ASML NETHERLANDS B.V. 发明人 DAMS JOHANNES ADRIANUS ANTONIUS THEODORUS
分类号 G03B27/58;G05B11/36;G03B27/42;G03B27/62;G03F7/20;G05B19/19;H01L21/027 主分类号 G03B27/58
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