| 摘要 |
A polishing pad ( 104, 300 ) having an annular polishing track ( 152, 320 ) and a plurality of groups ( 160, 308 ) of grooves ( 112, 304 ) repeated circumferentially about the rotational center ( 128 ) of the pad. The plurality of grooves in each group are arranged along a trajectory ( 164, 312 ) in an offset and overlapping manner so as to provide a plurality of overlapping steps ( 172, 316 ) within the annular polishing track. The groups may be arranged in spaced-apart or nested relation with one another.
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