发明名称 X-ray reflectometry of thin film layers with enhanced accuracy
摘要 A method for inspection of a sample that includes a first layer having a known reflectance property and a second layer formed over the first layer. The method includes directing radiation toward a surface of the sample and sensing the radiation reflected from the surface so as to generate a reflectance signal as a function of elevation angle relative to the surface. A feature due to reflection of the radiation from the first layer is identified in the reflectance signal. The reflectance signal is calibrated responsively to the identified feature and to the known reflectance property of the first layer. The calibrated reflectance signal is analyzed to determine a characteristic of the second layer. Other enhanced inspection methods are disclosed, as well.
申请公布号 US7062013(B2) 申请公布日期 2006.06.13
申请号 US20030689314 申请日期 2003.10.20
申请人 发明人
分类号 G01T1/36;G01N23/20 主分类号 G01T1/36
代理机构 代理人
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