发明名称 |
Mask, substrate with light reflective film, method for manufacturing light reflective film, liquid crystal display device, and electronic apparatus |
摘要 |
A substrate is provided with a light reflective film including a base and a reflective layer, in which a plurality of concave portions or convex portions formed on the surface of the base are randomly arranged in the plane direction in 100 to 2,000 RGB dot units or a whole screen unit, are formed using a mask in which light transmissive or non-transmissive portions are randomly arranged in the plane direction in 100 to 2,000 RGB dot units or the whole screen unit. |
申请公布号 |
US7060396(B2) |
申请公布日期 |
2006.06.13 |
申请号 |
US20030410518 |
申请日期 |
2003.04.09 |
申请人 |
SEIKO EPSON CORPORATION |
发明人 |
OTAKE TOSHIHIRO;MATSUO MUTSUMI;TSUYUKI TADASHI |
分类号 |
G02F1/1333;G02B5/02;G02B5/08;G02B5/28;G02B27/00;G02F1/1335;G03F1/08;G03F1/14;G03F1/52;G03F1/70 |
主分类号 |
G02F1/1333 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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