发明名称 Mask, substrate with light reflective film, method for manufacturing light reflective film, liquid crystal display device, and electronic apparatus
摘要 A substrate is provided with a light reflective film including a base and a reflective layer, in which a plurality of concave portions or convex portions formed on the surface of the base are randomly arranged in the plane direction in 100 to 2,000 RGB dot units or a whole screen unit, are formed using a mask in which light transmissive or non-transmissive portions are randomly arranged in the plane direction in 100 to 2,000 RGB dot units or the whole screen unit.
申请公布号 US7060396(B2) 申请公布日期 2006.06.13
申请号 US20030410518 申请日期 2003.04.09
申请人 SEIKO EPSON CORPORATION 发明人 OTAKE TOSHIHIRO;MATSUO MUTSUMI;TSUYUKI TADASHI
分类号 G02F1/1333;G02B5/02;G02B5/08;G02B5/28;G02B27/00;G02F1/1335;G03F1/08;G03F1/14;G03F1/52;G03F1/70 主分类号 G02F1/1333
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