发明名称 Non-volatile semiconductor memory device
摘要 Bitline conductor tracks are arranged parallel to one another and electrically insulated from a substrate provided with a basic doping. A memory layer sequence, especially a charge-trapping layer sequence with a dielectric memory layer between dielectric confinement layers, is provided at least in regions adjacent to the bitline conductor tracks. The memory cells comprise gate electrodes connected by wordlines, and channel regions below the gate electrodes. They can be programmed by the trapping of channel hot electrons that are accelerated between source and drain regions formed by induced bitlines that are generated by the application of voltages to the bitline conductor tracks.
申请公布号 US7061046(B2) 申请公布日期 2006.06.13
申请号 US20040952233 申请日期 2004.09.28
申请人 INFINEON TECHNOLOGIES AG 发明人 WILLER JOSEF;MIKOLAJICK THOMAS
分类号 H01L29/792 主分类号 H01L29/792
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