发明名称 |
System and method of correcting mask rule violations after optical proximity correction |
摘要 |
A method is provided for correcting rule violating areas of a photomask using a digital representation of the photomask. The method includes identifying violating areas of the photomask from a digital representation of the photomask. The violating areas include areas that violate a minimum width rule and/or areas that violate a minimum space rule for the photomask. The violating areas are then manipulated for the purpose of eliminating the violating areas. They are manipulated differently based on whether the violating area lies inside a design shape of a layout pattern to be imaged using the photomask and/or whether the violating area lies outside the design shape.
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申请公布号 |
US7062748(B2) |
申请公布日期 |
2006.06.13 |
申请号 |
US20030648493 |
申请日期 |
2003.08.25 |
申请人 |
INFINEON TECHNOLOGIES AG |
发明人 |
MELLMANN JOERG |
分类号 |
G06F17/50;G03C5/00;G03F1/00;H01L21/822 |
主分类号 |
G06F17/50 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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