发明名称 Semiconductor device realized by using partial SOI technology
摘要 A semiconductor substrate has a bulk region and a semiconductor region formed either on a buried insulating film or on a cavity region. The bulk region contains a plurality of memory cells, sense amplifiers and column selection gates, while the semiconductor region contains word line selection circuits and column selection circuits.
申请公布号 US7061814(B2) 申请公布日期 2006.06.13
申请号 US20040822673 申请日期 2004.04.13
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 NAMEKAWA TOSHIMASA;MIYANO SHINJI;SUZUKI ATSUSHI
分类号 G11C7/00;G11C11/401;G11C11/407;H01L21/8242;H01L27/02;H01L27/108 主分类号 G11C7/00
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