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发明名称
SEMICONDUCTOR SPUTTER PROCESS SIMULATION METHOD USING MONTE CARLO METHOD
摘要
申请公布号
KR20060062681(A)
申请公布日期
2006.06.12
申请号
KR20040101607
申请日期
2004.12.06
申请人
SANAYI SYSTEM CO., LTD.
发明人
WON, TAE YOUNG;YOON, SANG HO
分类号
H01L21/203
主分类号
H01L21/203
代理机构
代理人
主权项
地址
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