COMPOSITION FOR REMOVING PHOTORESIST, METHOD OF REMOVING PHOTORESIST AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE USING THE SAME,申请号KR20040101679-传众专利搜索

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发明名称	COMPOSITION FOR REMOVING PHOTORESIST, METHOD OF REMOVING PHOTORESIST AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE USING THE SAME
摘要
申请公布号	KR20060062738(A)	申请公布日期	2006.06.12
申请号	KR20040101679	申请日期	2004.12.06
申请人	SAMSUNG ELECTRONICS CO., LTD.	发明人	PARK, JUNG DAE;LEE, SANG EON;CHON, SANG MUN;LEE, YANG KOO;HEO, DONG CHUL;JUN, PIL KWON
分类号	G03F7/32	主分类号	G03F7/32
代理机构		代理人
主权项
地址

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