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发明名称
Method for forming copper diffusion barrier of semiconductor device
摘要
申请公布号
KR100588664(B1)
申请公布日期
2006.06.12
申请号
KR20030077756
申请日期
2003.11.04
申请人
发明人
分类号
H01L21/28
主分类号
H01L21/28
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代理人
主权项
地址
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