发明名称 Lithographic Apparatus, Device Manufacturing Method, and Method of Manufacturing an Optical Element
摘要 An optical element in a lithographic apparatus is manufactured using a low coefficient of thermal expansion (CTE) material that has a CTE zero-crossing at a temperature between the temperature at which the element is manufactured and the mean temperature at which it will be operated.
申请公布号 KR100588126(B1) 申请公布日期 2006.06.09
申请号 KR20020075855 申请日期 2002.12.02
申请人 发明人
分类号 G03F7/20 主分类号 G03F7/20
代理机构 代理人
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