发明名称 Method of Vaccum Process and the Device thereof
摘要 PROBLEM TO BE SOLVED: To stably operate the surface processing of a substrate to be processed, by preventing glow discharging due to inert gas generated between a susceptor and a vacuum processing container. SOLUTION: A bush made of porous ceramic is arranged between a susceptor and a vacuum processing container in the middle of an inert gas supplying path, and a guide bush 11 for guiding an elevation pin for carrying a substrate to be processed is constituted as the inside and outside double structure constituted of an insulator bush 11a for supporting the inside elevation pin and an outside porous ceramic 11b. The distance of a channel between the susceptor of the inert gas and the vacuum processing container is made long so that the glow discharging of the inert gas can be prevented. The guide bush 11 can be constituted so that a spiral groove constituted of an insulator can be formed with a hole for supporting the elevation pin at the central part, and with an inert gas channel at the outside part.
申请公布号 KR100588041(B1) 申请公布日期 2006.06.09
申请号 KR19990017615 申请日期 1999.05.17
申请人 发明人
分类号 H01L21/00;H05H1/46;C23C14/00;C23C16/44;C23C16/50;H01L21/02;H01L21/203;H01L21/205;H01L21/302;H01L21/3065 主分类号 H01L21/00
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