发明名称 SPECIMEN CARRIER AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a specimen carrier of high sensitivity which does not limit the substrate. SOLUTION: The specimen carrier comprises the substrate, a porous thin film having a plurality of pores that are arranged on the substrate and formed substantially perpendicularly with respect to the substrate, and a coating metal for covering the surface of the porous thin film and the surface of the pores. The main component except for oxygen of the porous thin film is silicon, germanium, or a mixture of silicon and germanium. The specimen carrier is manufactured in a process of forming a structure thin film on the substrate where a columnar material containing a first component is dispersed in a member containing a second component, namely a semiconductor material capable of forming eutectic crystal with the first component, a process of removing the columnar material and forming the porous thin film, a process of introducing a solution containing metal compound into the pores of the porous thin film, and a process of depositing metal on the surface of the porous thin film and the surface of the pores by chemically changing the metal compound. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006145230(A) 申请公布日期 2006.06.08
申请号 JP20040331860 申请日期 2004.11.16
申请人 CANON INC 发明人 ISHIDA YOHEI
分类号 G01N21/65;G01N33/543 主分类号 G01N21/65
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