| 摘要 |
An exposure apparatus for exposing a pattern of a mask onto an object, said exposure apparatus includes a light source part that includes a generating mechanism for generating a plasma, a condenser mirror for condensing a light radiated from the plasma, and a vacuum chamber for accommodating the generating mechanism and the condenser mirror, and has an opening that is provided at a position approximately corresponding to a position of a condensing point of the light condensed by the condenser mirror, an illumination optical system for illuminating the mask using the light from the light source part, a detector for detecting the light from the condensing point at an emission side of the condensing point, and an evaluation part for evaluating a life of the light source part based on a detected result by the detector.
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