发明名称 SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND VISCOUS LIQUID COATING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a semiconductor device capable of coating a viscous liquid 3 on a substrate 2 with a desired thickness and a method for coating the viscous liquid. <P>SOLUTION: This manufacturing method provides for a semiconductor device having a process for coating a viscous liquid 3. The viscous liquid 3 is coated on the principal surface of a substrate 2, a flexible coating material 5 whose binding power to molecules in the viscous liquid 3 is stronger than that between molecules in that liquid 3 is coated and adhered on the viscous liquid 3, and then a clothing material 5 is peeled off including part of the viscous liquid 3. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006147960(A) 申请公布日期 2006.06.08
申请号 JP20040338195 申请日期 2004.11.22
申请人 NEC ELECTRONICS CORP 发明人 HARA TOSHIYUKI
分类号 H01L21/60;H01L23/12 主分类号 H01L21/60
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