发明名称 |
HYDROPHILIC COATINGS, AND IMPROVED DEPOSITION TECHNOLOGY FORTHIN FILMS |
摘要 |
<p num="1">The invention provides certain embodiments that involve sputtering techniques for applying a mixed oxide film comprising silica and titania. In these embodiments, the techniques involve sputtering at least two targets in a common chamber (e.g., in a shared gaseous atmosphere). A first of these targets includes silicon, while a second of the targets includes titanium. Further, the invention provides embodiments involving a substrate bearing a hydrophilic coating, which can be deposited by sputtering or any other suitable thin film deposition technique. The invention also provides techniques and apparatuses useful for depositing a wide variety of coating types. For example, the invention provides thin film deposition technologies in which sputtering apparatuses or other thin film deposition apparatuses are employed.
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申请公布号 |
CA2608079(A1) |
申请公布日期 |
2006.06.08 |
申请号 |
CA20052608079 |
申请日期 |
2005.12.02 |
申请人 |
CARDINAL CG COMPANY |
发明人 |
BROWNLEE, JAMES;KRISKO, ANNETTE;GERMAN, JOHN;MYLI, KARI;PFAFF, GARY |
分类号 |
C03C17/36;G02B1/12 |
主分类号 |
C03C17/36 |
代理机构 |
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