发明名称 PATTERN PREPARATION PROCESSOR
摘要 PROBLEM TO BE SOLVED: To provide a pattern preparation processor capable of efficiently designing a large two-dimensional (2D) pattern by developing a basic pattern two-dimensionally and repeatedly. SOLUTION: The pattern preparation processor prepares a pattern graphic mathematical model 1 capable of expressing the whole graphics of a 2D developed pattern by setting attribute information such as the arrangement, shapes and colors of respective pixels of a basic pattern as basic feature information and mathematically describing connections of vertical and horizontal patterns of pattern graphics of a repeated pattern formed by developing the basic pattern two dimensionally, the behavior of the mathematical model is mathematically scanned and pattern graphic data can be easily generated from the obtained data. The mathematical model is expressed as a commutative linear expression system. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006146647(A) 申请公布日期 2006.06.08
申请号 JP20040337063 申请日期 2004.11.22
申请人 JAPAN SCIENCE & TECHNOLOGY AGENCY 发明人 HASEGAWA TAIDO
分类号 G06T11/20;G06F17/50;G06T11/80 主分类号 G06T11/20
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