发明名称 |
Lithographic apparatus and device manufacturing method |
摘要 |
A lithographic apparatus is disclosed wherein a liquid supply system is configured to at least partly fill a region between a substrate and a projection system of the lithographic apparatus with a liquid and having a liquid confinement structure fixed in a plane substantially perpendicular to an optical axis of the projection system and configured to cooperate with a substrate table configured to hold the substrate in order to restrict the liquid to a region above an upper surface of the substrate table so that a side of the substrate to be exposed is substantially covered in the liquid during exposure.
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申请公布号 |
US2006119809(A1) |
申请公布日期 |
2006.06.08 |
申请号 |
US20040005221 |
申请日期 |
2004.12.07 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
VERHAGEN MARTINUS CORNELIS MARIA;JANSEN HANS;STAVENGA MARCO K.;VERSPAY JACOBUS JOHANNUS L.H. |
分类号 |
G03B27/52 |
主分类号 |
G03B27/52 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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