| 摘要 |
An upper electrode layer is processed into plural electrode shapes with lithography and subsequent dry etching to pattern plural upper electrodes, followed by conducting an RTA treatment at a treatment temperature of a value in a range from 400° C. to 1000° C. and at an oxygen flow volume of a value in a range from 0.1 L/min to 100 L/min and, subsequently, by conducting an annealing treatment at a treatment temperature of 650° C. in an oxygen atmosphere for 60 minutes.
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