| 摘要 |
<P>PROBLEM TO BE SOLVED: To economically realize an microminiature semiconductor device having an recognition number by efficiently using electron beam lithography. <P>SOLUTION: A memory for identifying a recognition number of 128 bits using transistors is configured by contact holes selectively formed by using electron beam lithography. Size of a long side in a plane of a semiconductor chip is designed to be not more than 0.5 mm. The contact holes are formed together with contact holes of a peripheral circuit. In addition, the size of the long side in the plane of the semiconductor chip is designed to be smaller than thickness of a wafer before starting manufacturing, and larger than thickness after thinning the wafer. Particularly, the same data as a bar-code is further stored into the memory. Further particularly, the semiconductor chip is inspected using data with the recognition number being encrypted. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
