| 摘要 |
PROBLEM TO BE SOLVED: To provide a vapor deposition material feeding mechanism where, in the case vapor deposition materials are automatically fed to an evaporation source used for vacuum deposition, a large volume of the vapor deposition materials can be mounted, and are quantitatively fed. SOLUTION: The vapor deposition material feeding device for a vacuum deposition device where vapor deposition materials arranged at the inside of a vacuum chamber are deposited on the face of a substrate comprises: a storage vessel of piling a plurality of quantitatively formed vapor deposition materials; a receiving means of receiving at least one vapor deposition material dropt by opening the bottom face of the storage vessel; a dropping means of dropping the received vapor deposition material by opening the bottom face of the receiving means; and a moving means of changing the relative position between the storing vessel and the receiving means and the relative position between the receiving means and the dropping means in a horizontal plane. In the case the relative position of the storage vessel to the receiving means lies at a prescribed position, the opening of the bottom face in the storage vessel is performed, and in the case the relative position of the dropping means to the receiving means lies in a prescribed position, the opening of the bottom face in the receiving means is performed. COPYRIGHT: (C)2006,JPO&NCIPI
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