| 摘要 |
The polished object is prevented from sticking to the upper polishing mechanism wherein the sticking is a cause for the damages to the polished object and reduction of the yield. There is provided a double side polishing method comprising steps of: inserting an object between a pair of upper and lower polishing mechanisms and polishing the object by rotating or sliding the object therebetween, wherein an adsorption strength of a contact surface of the upper polishing mechanism onto the object is weaker than an adsorption strength of a contact surface of the lower polishing mechanism onto the object.
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