发明名称 |
SPUTTERED TRANSPARENT CONDUCTIVE FILMS |
摘要 |
A hollow cathode sputtering apparatus and related method for introducing dopants into a sputtered coating is provided. The method utilizes a sputter reactor which includes a cathode channel that allows a gas stream to flow therein and a flow exit end from which gases may flow out of and towards a substrate to be coated. The cathode channel as used in the invention is defined by a channel defining surface that includes at least one target material. The sputter reactor further includes a dopant target positioned to provide dopant atoms to the gas stream when the gas stream is flowed through the cathode channel.
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申请公布号 |
US2006118406(A1) |
申请公布日期 |
2006.06.08 |
申请号 |
US20050275079 |
申请日期 |
2005.12.08 |
申请人 |
ENERGY PHOTOVOLTAICS, INC. |
发明人 |
DELAHOY ALAN E.;GUO SHEYU;LYNDALL ROBERT B.;SELVAN J.A. A. |
分类号 |
C23C14/00 |
主分类号 |
C23C14/00 |
代理机构 |
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地址 |
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