| 发明名称 |
MASK FOR REFLECTING ELECTROMAGNETIC WAVE AND METHOD FOR MANUFACTURING SAME |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a mask for lithography and a method for manufacturing the same. <P>SOLUTION: A substrate, a reflecting layer (12) formed on the substrate (11) and made of a material that reflects electromagnetic waves, and an absorbing body pattern (20) formed into a predetermined pattern such that electromagnetic wave passing regions through which the electromagnetic waves pass are provided on the reflecting layer (12) and made of a material that absorbs the electromagnetic waves are comprised and on the side of the absorbing body pattern adjacent to the electromagnetic wave passing region, at least one inclined side (21) is comprised for the reflecting layer (12). <P>COPYRIGHT: (C)2006,JPO&NCIPI |
| 申请公布号 |
JP2006148113(A) |
申请公布日期 |
2006.06.08 |
| 申请号 |
JP20050332179 |
申请日期 |
2005.11.16 |
| 申请人 |
SAMSUNG ELECTRONICS CO LTD |
发明人 |
SONG I-HUN;RYU GENICHI;KIM SUK-PIL;KIM HOON;CHANG SEUNG-HYUK;KIM WOO-JOO;PARK YOUNG-SOO |
| 分类号 |
H01L21/027;G03F1/22;G03F1/24 |
主分类号 |
H01L21/027 |
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