| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method to measure the properties of the projection lens of a lithography apparatus such as a numerical aperture and telecentric property. <P>SOLUTION: This lithography apparatus comprises an interference sensor IS having a detector DT to measure the wave surface of irradiation beams at the level of a substrate, actuator that performs displacement of the interference sensor in the direction of optical axis, primary module to measure phase changes of the wave surface resulting from the displacement of the inference sensor between a primary position and secondary position performed by the actuator, and secondary module that produces a map between the location of the detector and that of the corresponding pupil in pursuit of the location of the pupil corresponding to the pupil surface of a projection system that radiation crosses with reference to each of the multiple locations of the detector using the values of the phase changes measured by the primary module and those of the displacement of the inference sensor performed by the actuator. After the map is produced, the numerical aperture and telecentric property of the projection system can be measured. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
