NON-CORROSIVE STRIPPING AND CLEANING COMPOSITION

摘要

PROBLEM TO BE SOLVED: To provide a stripping and cleaning composition for removing a wide variety of both organic polymeric materials and plasma-etch residues without any reduction in a stripping rate of photoresist or any reduction in the effectiveness of removing plasma-etch residues. SOLUTION: The non-corrosive photoresist stripping and cleaning composition comprises: (a) about 5 to about 50% of a solvent; (b) about 10 to about 90% of an alkanolamine; (c) about 0.1 to 10% of a carboxylic acid type anticorrosive; and (d) about 1.0 to 40% of water. COPYRIGHT: (C)2006,JPO&NCIPI