发明名称 METHOD FOR INSPECTING WAFER
摘要 PROBLEM TO BE SOLVED: To provide a method that guarantees a defect or occurrence of a defect on a semiconductor wafer to be recognized at an early time. SOLUTION: In order to check on an obvious or latent defect on a semiconductor wafer 10, a wafer is compared with a wafer by limiting a specific comparison area 22 selectable by a user instead of comparing a wafer with a wafer across the whole area of the semiconductor wafer 10. This comparison area 22 can be selected manually, but it can be automatically selected using a learning mode. Preferably the comparison area 22 should be selected such that it includes an edge 24 of the wafer 10. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006148091(A) 申请公布日期 2006.06.08
申请号 JP20050318224 申请日期 2005.11.01
申请人 VISTEC SEMICONDUCTOR SYSTEMS GMBH 发明人 RICHTER JOERG;MICHELSSON DETLEF
分类号 H01L21/66 主分类号 H01L21/66
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