发明名称 MANUFACTURING METHOD OF SEMICONDUCTOR LASER
摘要 PROBLEM TO BE SOLVED: To improve a COD level by installing a window structure, without depending on doping of impurity to an end face of a resonator, in a semiconductor laser that uses a group III-V nitride compound semiconductor containing In. SOLUTION: In a manufacturing method of the semiconductor laser that uses the group III-V nitride compound semiconductor comprising In, the resonator end face 21 of the semiconductor laser is formed. The resonator end face 21 is exposed to plasma atmosphere containing H<SB>2</SB>or radical atmosphere containing H<SB>2</SB>. Desorption of In from vicinity of the resonator end face 21 is conducted. Thus, the window structure, where a band gap Eg of the active layer of the semiconductor laser is made large, is formed. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006147814(A) 申请公布日期 2006.06.08
申请号 JP20040335378 申请日期 2004.11.19
申请人 SONY CORP 发明人 TAKEYA MOTONOBU
分类号 H01S5/028 主分类号 H01S5/028
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