发明名称 Semiconductor device and manufacturing method thereof
摘要 A semiconductor device having high operating performance and reliability, and a manufacturing method thereof are provided. An LDD region 207 provided in an n-channel TFT 302 forming a driving circuit enhances the tolerance for hot carrier injection. LDD regions 217 - 220 provided in an n-channel TFT (pixel TFT) 304 forming a pixel portion greatly contribute to the decrease in the OFF current value. Here, the LDD region of the n-channel TFT of the driving circuit is formed such that the concentration of the n-type impurity element becomes higher as the distance from an adjoining drain region decreases.
申请公布号 US2006121736(A1) 申请公布日期 2006.06.08
申请号 US20060330152 申请日期 2006.01.12
申请人 SEMICONDUCTOR ENERGY LABORATORY CO., LTD. 发明人 YAMAZAKI SHUNPEI
分类号 H01L21/302;G02F1/1362;H01L21/336;H01L21/77;H01L21/84;H01L27/12;H01L27/32;H01L29/423;H01L29/49;H01L29/786 主分类号 H01L21/302
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