| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a sputtering method, a sputtering apparatus, a piezoelectric element manufacturing method, and a liquid spray head having a piezoelectric element capable of depositing an excellent thin film of the uniform film thickness on a substrate. <P>SOLUTION: When depositing a thin film by sputtering a target 402 on a surface of a substrate 110 arranged facing the target 402, the spacing (TS) between the surface of the target 402 and the surface of the substrate 110 is set to be ≥100 mm. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
