| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photopolymerizable resin composition having high resolution, high adhesion, and resist stripping property as a resist material of an etching resist or a plating resist and excellent also in dispersion stability in a developer. <P>SOLUTION: The alkali-developable photopolymerizable resin composition contains (A) 30-80 mass% of a carboxyl group-containing binder, (B) 15-60 mass% of a photopolymerizable monomer and (C) 0.01-20 mass% of a photopolymerization initiator, wherein the carboxyl group-containing binder (A) contains a copolymer (a-1) having a weight average molecular weight of 5,000-500,000 obtained by copolymerizing at least 15-35 mass% of a monomer represented by formula (I), 10-80 mass% of a monomer represented by formula (II) and 1-50 mass% of a monomer represented by formula (III) in an amount of ≥5 mass% based on 100 mass% of the component (A). <P>COPYRIGHT: (C)2006,JPO&NCIPI |
