| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide chemically amplified positive photoresist compositions containing a resin comprising acetal and alicyclic groups. <P>SOLUTION: The photoresist compositions comprise (i) one or more resins comprising one or more substituents comprising one or more photoacid-labile acetal groups and one or more alicyclic groups and (ii) one or more photoacid generator compounds. Photoresists of the invention can exhibit notably enhanced lithographic properties. Preferred photoresists of the invention comprise one or more photoacid generator compounds and one or more phenolic resins comprising one or more photoacid-labile acetal groups and one or more alicyclic groups (such as adamantyl). <P>COPYRIGHT: (C)2006,JPO&NCIPI |
