| 摘要 |
PROBLEM TO BE SOLVED: To provide an annealing process device for efficient annealing while preventing degradation in quality of it. SOLUTION: When a substrate W is carried into a chamber 1 by a robot hand 8, a gas flow F is jetted to the robot hand 8 and the substrate W from a nozzle 12 provided around a carry-in port 1c of the chamber 1. Since the gas flow F comprises the flow speed component in the direction from the inside of chamber 1 to the outside, the external air, particles, or the like is prevented from entering the chamber 1 along with the substrate W. So, no evacuation process of the chamber 1 is required. Further, fluctuation in gas concentration in the chamber 1 is prevented. COPYRIGHT: (C)2006,JPO&NCIPI
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