| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a method of producing a glass substrate for an electronic device free of a surface defect such as a crack near a surface thereof and having little rolled edge of an end face thereof, and a method of producing a photo mask blank free of a defect under a film. <P>SOLUTION: In the method of producing a glass substrate for an electronic device whereby to fabricate a glass substrate by carrying out a rough polishing step for polishing a surface of the glass substrate by using relatively large abrasive particles, then a precision polishing step for polishing it by using relatively small abrasive particles, before carrying out the precision polishing step, the surface of the glass substrate is etched (preferably etched with an alkaline aqueous solution) so as to elicit a crack extending in the depth direction from the surface of the glass substrate, the crack remaining after the precision polishing step, in a defect inspection step carried out after the precision inspection step. A photo mask blank and the method of producing a photo mask blank are also provided. <P>COPYRIGHT: (C)2006,JPO&NCIPI</p> |
