| 摘要 |
<p>A composition for antireflection film formation which has excellent applicability, is significantly inhibited from generating ultrafine bubbles, gives an antireflection film capable of sufficiently reducing the standing wave effect, and has excellent solubility in water and an alkaline developing solution. The composition for antireflection film formation contains: (A) a copolymer (salt) of a sulfo-containing acrylamide derivative represented by, e.g., 2-(meth)acrylamido-2-methylpropanesulfonic acid and a fluoroalkylated acrylic ester derivative represented by, e.g., 2,2,3,3,3-pentafluoropropyl (meth)acrylate; and (B) a surfactant whose 0.1 wt.% aqueous solution has a surface tension as measured at 25°C of 45 mN/m or lower.</p> |
