EXPOSURE APPARATUS, EXPOSURE METHOD AND DEVICE MANUFACTURING METHOD

摘要

An exposure apparatus (EX) exposes a substrate (W) by irradiating the substrate (W) with exposure light (EL) through a projection optical system (PL). The projection optical system (PL) is provided with a first optical element (LS1) which is closest to an image plane of the projection optical system (PL), and a second optical element (LS2) which is second closest to the image plane after the first optical element (LS1). The exposure apparatus (EX) is provided with a liquid immersion mechanism (2) for filling a first space (K1) on a side of a lower plane (T3) of the second optical element (LS2) with a liquid (LQ), a gas replacing apparatus (3) for filling a second space (K2) on a side of an upper plane (T4) of the second optical element (LS2) with a gas, and a controller (CONT) for adjusting a pressure difference between a pressure of the liquid (LQ) of the first space (K1) and a pressure of the gas in the second space (K2).