发明名称 SUBSTRATE ROTATION TYPE TREATMENT DEVICE
摘要 PROBLEM TO BE SOLVED: To provide an apparatus which prevents a treatment liquid scattered from the front surface of a rotating substrate rebounds by the internal wall surface of a cup and which can prevent that the treatment liquid adheres to the inner wall surface of the cup while the treatment liquid stays on the inner wall surface of the cup for a long time, and is dried, to cause the deposition of impurities and a treatment liquid component. SOLUTION: A hydrophilic front surface and a hydrophobic front surface are intermingled on the inner wall surface of a top side cup 24 of a part of the cup 16 held by a spin chuck 10 to which the treatment liquid scattered from above the substrate collides with the cap and surrounds the side and the lower side of the rotating substrate W. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006147673(A) 申请公布日期 2006.06.08
申请号 JP20040332625 申请日期 2004.11.17
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 TOKURI KENTAROU
分类号 H01L21/304;B08B3/02;H01L21/027 主分类号 H01L21/304
代理机构 代理人
主权项
地址