发明名称 SUBSTRATE PROCESSOR AND PARTICLE REMOVING METHOD
摘要 PROBLEM TO BE SOLVED: To provide technology for efficiently removing particles in a processing tank in short time in a soaking-type substrate processor. SOLUTION: Micro bubbles are supplied from a micro bubble generator 30 to processing liquid in the processing tank 10. The micro bubbles are removed in bubble removers 61 and 62 arranged in the middle of the route of a circulation system 40 of processing liquid. The particles in the processing tank 10 are adsorbed by the micro bubbles, are circulated with flow of processing liquid, and are removed with the micro bubbles in bubble removers 61 and 62. Since sizes of the micro bubbles are minute, they have wide surface areas as a whole, and the particles in processing liquid are efficiently adsorbed and removed. Nano bubbles can be used which are minuter than the micro bubbles. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006147617(A) 申请公布日期 2006.06.08
申请号 JP20040331543 申请日期 2004.11.16
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 HIGUCHI AYUMI;ARAI KENICHIRO
分类号 H01L21/304 主分类号 H01L21/304
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