| 摘要 |
A lithographic apparatus for reducing the visibility of artifacts in the pattern is provided. The apparatus comprises an illumination system, a patterning device, a projecting system, and a modulating device. The illumination system supplies a beam of radiation. The patterning device patterns the beam. The projection system projects the beam onto a target portion of a substrate. The modulating device modulates the beam to impart the pattern with a modulation scheme.
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