发明名称 SUBSTRATE-TREATING APPARATUS
摘要 A substrate-treating apparatus for holding a substrate and a treating tool in a contact relation always at a predetermined pressure. A substrate-treating apparatus has, on a bracket (10) vertically moved by a lifting device (15), a treating tool (3) for performing treatment such as cleaning while being in contact with a surface of a substrate (1) at a set pressure; an operating shaft (4) to which the treating tool (3) is attached; a holding member (6) for supporting the operating shaft (4) so as to be free only in the rotating direction; a servomotor (11) connected to the holding member (6) and vertically moving the operating shaft (4); and a motor (8) for rotation to which the operating shaft (4) is connected with a pin joint (9). The substrate-treating apparatus has, separately from the lifting device (15) of the bracket (10), the servomotor (11) for vertically moving the operating shaft (4), and the servomotor (11) is excited according to the difference between the weight of the operating shaft (4) including the treating tool (3) and a predetermined contact pressure (weight), causing output torque to be added to the operating shaft (4) to offset the weight of the operating shaft (4). As a result, the treating tool (3) is brought to be in contact with the substrate surface at a weight corresponding to the predetermined contact pressure.
申请公布号 KR20060061792(A) 申请公布日期 2006.06.08
申请号 KR20067000797 申请日期 2006.01.12
申请人 KABUSHIKI KAISHA YASKAWA DENKI 发明人 NAKAMURA KENICHIRO;HIRAYAMA TSUYOSHI;MOMODOMI MINORU;KIYOKAWA KENJI
分类号 B08B1/04;H01L21/304;H01L21/027 主分类号 B08B1/04
代理机构 代理人
主权项
地址