METHOD OF MANUFACTURING SILICON OPTICAL ELEMENT, SILICON OPTICAL ELEMENT MANUFACTURED BY THE METHOD, AND IMAGE INPUT/OUTPUT APPARATUS APPLYING THE SAME

摘要

PROBLEM TO BE SOLVED: To provide a method of manufacturing a silicon optical element in which wavelength selectivity can be improved by controlling a micro-cavity length, and to provide the silicon optical element manufactured by the method and an image input/output apparatus applying the same.

SOLUTION: The method of manufacturing the silicon optical element comprises a process of preparing an n-type or p-type substrate based on silicon; a process of forming at least a part of one surface of the substrate with polysilicon; a process of forming a small defective bend in an interface between a silicon oxide layer and the substrate due to accelerated oxidation caused by to oxygen moving through the grain boundary of the polysilicon in a silicon oxide layer forming process of oxidizing the surface of the substrate, in which the polysilicon is formed and forming a structure in which the silicon oxide layer is formed on the substrate; a process of etching the silicon oxidation layer to expose the minute defective bend formed in the interface of the silicon oxide layer and the substrate in the silicon oxide layer forming process; and a process of forming a doped region by doping the small defective bend to a type opposite to that of the substrate.

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